The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Mar. 04, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Kai D. Feng, Hopewell Junction, NY (US);

Wai-Kin Li, Beacon, NY (US);

Ping-Chuan Wang, Hopewell Junction, NY (US);

Zhijian Yang, Stormville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01R 43/00 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H04L 9/32 (2006.01); H05K 1/02 (2006.01); H01L 21/027 (2006.01); H01L 21/321 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5222 (2013.01); H01L 21/0274 (2013.01); H01L 21/3212 (2013.01); H01L 21/7684 (2013.01); H01L 21/76816 (2013.01); H01L 21/76834 (2013.01); H01L 21/76837 (2013.01); H01L 21/76877 (2013.01); H01L 23/528 (2013.01); H01L 23/5226 (2013.01); H04L 9/3278 (2013.01); H05K 1/0289 (2013.01); H01L 2924/0002 (2013.01); H04L 2209/12 (2013.01); Y10T 29/49117 (2015.01); Y10T 29/49165 (2015.01);
Abstract

A method for fabricating an interconnect function array includes forming a first plurality of conductive lines on a substrate, forming an insulator layer over the first plurality of conductive lines and the substrate, removing portions of the insulator layer to define cavities in the insulator layer that expose portions of the substrate and the first plurality of conductive lines, wherein the removal of the portions of the insulator layer results in a substantially random arrangement of cavities exposing portions of the substrate and the first plurality of conductive lines, depositing a conductive material in the cavities, and forming a second plurality of conductive lines on portions of the conductive material in the cavities and the insulator layer.


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