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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9766554 B1

PDFFull Text
Expired
Date of Patent:
Sep. 19, 2017

Filed:

May. 20, 2015

Method and apparatus for estimating focus and dose of an exposure process

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Yen-Liang Chen, Zhubei, TW;

Chih-Ming Ke, Hsinchu, TW;

Kai-Hsiung Chen, New Taipei, TW;

Wen-Zhan Zhou, Zhubei, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Michelle M Iacoletti

Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70683 (2013.01); G03F 7/70483 (2013.01); G03F 7/70558 (2013.01); G03F 7/70625 (2013.01); G03F 7/70641 (2013.01); G03F 9/7026 (2013.01);
Abstract

A structure in semiconductor fabrication includes at least a first periodic asymmetric feature and a periodic asymmetric second feature. The first feature contains a plurality of periodically distributed first elements. The first feature has a first asymmetric profile such that the first feature no longer has the same first asymmetric profile when it is rotated by 180 degrees. The second feature contains a plurality of periodically distributed second elements. The second feature has a second asymmetric profile such that the second feature no longer has the same second asymmetric profile when it is rotated by 180 degrees. The second asymmetric profile is different from the first asymmetric profile.

Find Patent Forward Citations

Chen, Yen-Liang. (2017). Method and apparatus for estimating focus and dose of an exposure process (U.S. Patent No. 9766554). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9766554

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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