The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Aug. 20, 2015
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventor:

Manfred Maul, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/09 (2006.01); G02B 27/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70566 (2013.01); G02B 5/09 (2013.01); G02B 27/0905 (2013.01); G03F 7/70075 (2013.01); G03F 7/70116 (2013.01); G03F 7/70191 (2013.01); G02B 27/0983 (2013.01);
Abstract

The disclosure provides an illumination optical unit for projection lithography, which illuminates an object field with illumination light. The illumination optical unit includes a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The field facets are imaged in the object field by a transfer optical unit. The pupil facet mirror includes a pupil facet mirror polarization section and a pupil facet mirror neutral section. The polarization section is arranged so that the illumination light is reflected in the region of a Brewster angle. The neutral section is arranged so that the illumination light is reflected in the region of a normal incidence.


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