The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9766539 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 19, 2017

Filed:

Feb. 19, 2014
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Ryo Nakayama, Utsunomiya, JP;

Yuichi Gyoda, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/70 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 7/70433 (2013.01); G03F 7/70466 (2013.01);
Abstract

A method which determines patterns for a plurality of masks to be executed by a processor includes acquiring data on a pattern containing a plurality of pattern elements, and assigning the acquired plurality of pattern elements into masks, decomposing the acquired plurality of pattern elements into patterns of the masks, and calculating an evaluation value for an evaluation index, based on a number of masks, the distances between a plurality of pattern elements in each mask, and an angle of a line connecting a plurality of pattern elements in each mask. In the method, a pattern of each mask is determined based on the calculated evaluation value.


Find Patent Forward Citations

Nakayama, Ryo. (2017). Method for determining mask pattern, non-transitory recording medium, and information processing apparatus (U.S. Patent No. 9766539). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9766539

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