The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Apr. 22, 2015
Applicant:

Arisawa Mfg. Co., Ltd., Niigata, JP;

Inventors:

Yasuaki Umezawa, Niigata, JP;

Tatsuya Sato, Niigata, JP;

Kazuhiro Ura, Niigata, JP;

Kenichi Watabe, Niigata, JP;

Yuichi Kakubari, Niigata, JP;

Assignee:

ARISAWA MFG. CO., LTD, Nigata, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 27/28 (2006.01); G03F 1/38 (2012.01); G02B 5/30 (2006.01); G02F 1/1337 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 5/3016 (2013.01); G02B 5/3033 (2013.01); G02B 27/288 (2013.01); G02F 1/133788 (2013.01); G03F 1/38 (2013.01); G03F 7/0035 (2013.01);
Abstract

Provided is an exposure apparatus including a transporting section; a first polarized light output section that outputs first polarized light; a second polarized light output section that outputs second polarized light; a first mask section that has formed therein a first aperture section that passes the first polarized light for exposing an orientation film and blocks the first polarized light; and a second mask section that has formed therein a second aperture section that passes the second polarized light for exposing the orientation film and blocks the second polarized light. The first aperture section and the second aperture section are formed to expose a certain region of the orientation film in an overlapping manner.


Find Patent Forward Citations

Loading…