The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Jul. 19, 2012
Nobuya Tomosue, Tokyo, JP;
Hiroki Nakamura, Tokyo, JP;
Tadashi Sakane, Tokyo, JP;
Nichias Corporation, Tokyo, JP;
Abstract
A gas processing device is disclosed that makes it possible to appropriately control the frictional resistance between a holding mat and a casing. A gas processing device () includes a processing structure (), a casing () made of a metal and housing the processing structure (), and a holding mat () formed of inorganic fibers and placed between the processing structure () and the casing (), an inner surface () of the casing () and an outer surface () of the holding mat () coming in contact with each other through an adhesive layer () that includes a compound that includes a structural unit represented by a general formula (I). wherein Rare independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a phenyl group, or a hydroxyl group, and n is an integer equal to or larger than 1.