The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
May. 13, 2010
Soo Young Choi, Fremont, CA (US);
Suhail Anwar, San Jose, CA (US);
Gaku Furuta, Sunnyvale, CA (US);
Beom Soo Park, San Jose, CA (US);
Robin L Tiner, Santa Cruz, CA (US);
John M White, Hayward, CA (US);
Shinichi Kurita, San Jose, CA (US);
Soo Young Choi, Fremont, CA (US);
Suhail Anwar, San Jose, CA (US);
Gaku Furuta, Sunnyvale, CA (US);
Beom Soo Park, San Jose, CA (US);
Robin L Tiner, Santa Cruz, CA (US);
John M White, Hayward, CA (US);
Shinichi Kurita, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments disclosed herein generally relate to an apparatus having an anodized gas distribution showerhead. In large area, parallel plate RF processing chambers, mastering the RF return path can be challenging. Arcing is a frequent problem encountered in RF processing chambers. To reduce arcing in RF processing chambers, straps may be coupled to the susceptor to shorten the RF return path, a ceramic or insulating or anodized shadow frame may be coupled to the susceptor during processing, and an anodized coating may be deposited onto the edge of the showerhead that is nearest the chamber walls. The anodized coating may reduce arcing between the showerhead and the chamber walls and therefore enhance film properties and increase deposition rate.