The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2017

Filed:

Jan. 11, 2013
Applicant:

Scivax Corporation, Kanagawa, JP;

Inventors:

Hirosuke Kawaguchi, Tokyo, JP;

Tatsuya Hagino, Kanagawa, JP;

Satoru Tanaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 51/10 (2006.01); B29L 31/00 (2006.01); B29K 101/12 (2006.01); B29K 105/00 (2006.01); B29C 51/06 (2006.01); B29C 51/26 (2006.01); B29C 51/42 (2006.01); B29C 51/46 (2006.01);
U.S. Cl.
CPC ...
B29C 51/10 (2013.01); B29C 51/06 (2013.01); B29C 51/262 (2013.01); B29C 51/421 (2013.01); B29C 51/46 (2013.01); B29K 2101/12 (2013.01); B29K 2105/256 (2013.01); B29L 2031/756 (2013.01); B29L 2031/7739 (2013.01);
Abstract

A shaping method and a shaping device are provided which can easily and inexpensively form a curved face in a film including a micropattern. A shaping method is for forming, in a predetermined shaping-target area of a film including a patterned face with a micropattern, and a rear face opposite to the patterned face, a curved face beyond the thickness of the film, and includes a fixing step for fixing an outer edge of the shaping-target area of the film by fixing means, a first heating step for heating the filmby heating means, and a pressure adjusting step for producing a predetermined pressure difference between both faces of the film by the pressurizing means in such a way that pressure at a side where the film is fixed in the fixing step becomes small to form a pre-curved face.


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