The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Jul. 08, 2014
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Puneesh Puri, Bengaluru, IN;

Jiho Kang, Portland, OR (US);

James Y. Jeong, Beaverton, OR (US);

Assignee:

INTEL CORPORATION, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); H01L 23/00 (2006.01); H01L 21/762 (2006.01); H01L 29/06 (2006.01); H01L 23/48 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 23/562 (2013.01); H01L 21/76224 (2013.01); H01L 21/76229 (2013.01); H01L 21/76831 (2013.01); H01L 21/76832 (2013.01); H01L 21/76897 (2013.01); H01L 23/481 (2013.01); H01L 23/53238 (2013.01); H01L 23/53295 (2013.01); H01L 24/05 (2013.01); H01L 29/0649 (2013.01); H01L 2224/05025 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Techniques are disclosed for through-body via liner structures and processes of forming such liner structures in an integrated circuit. In an embodiment, an integrated circuit includes a silicon semiconductor substrate having one or more through-silicon vias (TSVs), although other through-body vias can be used as will be appreciated in light of this disclosure. Each TSV extends through at least a portion of the substrate, for example, from one side (e.g., top) of the substrate to the opposite side of the substrate (e.g., bottom), or from one internal layer of the substrate to another internal layer. A liner is disposed between the substrate and each TSV. The liner is formed of multiple alternating layers of dissimilar insulation films (e.g., tensile films and compressive films) sandwiched together.


Find Patent Forward Citations

Loading…