The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Jun. 24, 2014
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventor:
Donald Pettibone, San Jose, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01); G06T 5/00 (2006.01); G06T 7/00 (2017.01); G06T 5/50 (2006.01);
U.S. Cl.
CPC ...
G06T 5/002 (2013.01); G06T 5/50 (2013.01); G06T 7/001 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Improvement of wafer surface inspection sensitivity includes acquiring a first inspection image from the surface of the wafer, generating a reference image by applying a thresholding function to the first image in order to isolate a speckle signal component of the first image induced by wafer surface roughness, acquiring one or more measurement inspection images from the surface of the wafer, and generating a difference image by subtracting the generated one or more reference images from the acquired one or more measurement inspection images.