The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Aug. 11, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination optical unit for projection lithography serves for illuminating an object field, in which an object to be imaged can be arranged, with illumination light. The illumination optical unit has a field facet mirror having a plurality of field facets. Furthermore, the illumination optical unit has a pupil facet mirror having a plurality of pupil facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has a deflection facet mirror having a plurality of deflection facets, which is arranged in the illumination beam path between the field facet mirror and the pupil facet mirror. This results in an illumination optical unit in which the illumination of the object to be imaged can be configured flexibly and can be adapted well to predefined values.