The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Dec. 10, 2014
Applicant:
Mitsubishi Materials Corporation, Tokyo, JP;
Inventor:
Toshiaki Ueda, Akita, JP;
Assignee:
MITSUBISHI MATERIALS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/18 (2006.01);
U.S. Cl.
CPC ...
C01B 33/18 (2013.01); C01P 2002/02 (2013.01); C01P 2004/51 (2013.01); C01P 2004/61 (2013.01); C01P 2006/10 (2013.01); C01P 2006/12 (2013.01); C01P 2006/80 (2013.01);
Abstract
The purpose of the present invention is to provide: a synthetic amorphous silica powder which is suitable as a raw material for a synthetic silica glass product used in a high-temperature and reduced-pressure environment, which can yield a synthetic silica product such that the occurrence or expansion of air bubbles in the glass product is inhibited even in use in a high-temperature and reduced-pressure environment, and which can be obtained at a relatively low cost; and a process for manufacturing the same.