The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
May. 05, 2016
Lam Research Corporation, Fremont, CA (US);
Jason Daejin Park, Lake Oswego, OR (US);
Bart van Schravendijk, Sunnyvale, CA (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A method for densifying a dielectric film on a substrate includes arranging a substrate including a dielectric film on a substrate support in a substrate processing chamber; supplying a gas mixture including helium and oxygen to the substrate processing chamber; controlling pressure in the substrate processing chamber to a pressure greater than or equal to a predetermined pressure; supplying a first power level at a first frequency to a coil to create plasma in the substrate processing chamber. The coil is arranged around an outer surface of the substrate processing chamber. The method includes densifying the dielectric film for a predetermined period. The pressure and the first power level are selected to prevent sputtering of the dielectric film during densification of the dielectric film.