The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Jun. 03, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Paul Janssen, Veldhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Petrus Jacobus Maria Van Gils, Berkel-Enschot, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70733 (2013.01); G03F 7/70708 (2013.01); G03F 7/70783 (2013.01); H01L 21/6831 (2013.01); G03F 7/70866 (2013.01);
Abstract
A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.