The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Oct. 30, 2015
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Jiyou Fu, Sunnyvale, CA (US);

Noam Sapiens, Cupertino, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G01N 21/88 (2006.01); G01B 11/06 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8851 (2013.01); G01B 11/0616 (2013.01); G01N 21/8806 (2013.01); G01N 21/9501 (2013.01); G01N 2021/8848 (2013.01);
Abstract

Methods and systems for simultaneous detection and linked processing of field signals and pupil signals are presented herein. In one aspect, estimates of one or more structural or process parameter values are based on field measurement signals, pupil measurement signals, or both. In addition, the quality of the measurements of the one or more structural or process parameter values is characterized based on the field measurement signals, pupil measurement signals, or both. In some embodiments, field measurement signals are processed to estimate one or more structural or process parameter values, and pupil measurement signals are processed to characterize the field measurement conditions. In some other embodiments, pupil measurement signals are processed to estimate one or more structural or process parameter values, and field measurement signals are processed to characterize the pupil measurement conditions.


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