The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Dec. 15, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Richard W. Solarz, Danville, CA (US);

Ilya Bezel, Mountain View, CA (US);

Anatoly Shchemelinin, Bozeman, MT (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/094 (2006.01); H01S 3/22 (2006.01); H01S 3/225 (2006.01); H01S 3/0941 (2006.01); H01S 3/036 (2006.01);
U.S. Cl.
CPC ...
H01S 3/094 (2013.01); H01S 3/225 (2013.01); H01S 3/2207 (2013.01); H01S 3/036 (2013.01); H01S 3/0941 (2013.01); H01S 3/094042 (2013.01); H01S 3/094053 (2013.01);
Abstract

Disclosed are methods and apparatus for generating a sub-200 nm continuous wave (cw) laser. A laser apparatus includes a chamber for receiving at least a rare gas or rare gas mixtures and a pump laser source for generating at least one cw pump laser focused in the chamber for generating at least one laser-sustained plasma in the chamber. The laser apparatus further includes a system for forming an optical cavity in which the at least one laser-sustained plasma serves as an excitation source for producing at least one cw laser having a wavelength that is below about 200 nm. In one aspect, the at least one laser-sustained plasma has a shape that substantially matches a shape of the optical cavity.


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