The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Mar. 26, 2013
Applicant:

Nuflare Technology, Inc, Numazu-shi, Shizuoka, JP;

Inventors:

Takumi Yamada, Shizuoka, JP;

Yuusuke Sato, Tokyo, JP;

Assignee:

NuFlare Technology, Inc, Yokohama-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01L 21/02 (2006.01); C30B 25/10 (2006.01); C30B 25/12 (2006.01); C30B 25/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02104 (2013.01); C23C 16/4585 (2013.01); C30B 25/10 (2013.01); C30B 25/12 (2013.01); C30B 25/14 (2013.01);
Abstract

A film-forming apparatus and film-forming method comprising, a chamber, a first gas supply unit supplying a reaction gas for a film-forming process to the chamber, a substrate-supporting portion supporting a substrate placed in the chamber, a heating unit heating the substrate from below the substrate-supporting portion, a rotary drum supporting the substrate-supporting portion on a top thereof, and including the heating unit disposed therein, a rotary shaft disposed in a lower part of the chamber, and rotating the rotary drum, a reflector reflecting heat from the heating unit, surrounding the rotary drum, and being disposed so as to have an upper end higher in height than an upper end of the substrate-supporting portion, and a second gas supply unit supplying a hydrogen gas or an inert gas between the rotary drum and the reflector.


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