The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Mar. 20, 2014
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Mark Davis Smith, Austin, TX (US);
John Biafore, Glocester, RI (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/10 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01);
Abstract
A photoresist modelling system includes a mathematical model for a photolithography process. The mathematical model may be executable using a computer processor. The mathematical model may be used to model a photoresist as formed on a semiconductor wafer surface. A blocked polymer concentration gradient equation may be implemented into the mathematical model. The blocked polymer concentration gradient equation may describe an initial concentration gradient of a blocked polymer in the photoresist being modelled by the mathematical model.