The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Jun. 21, 2010
Applicants:

Tadashi Hatanaka, Funabashi, JP;

Isao Adachi, Funabashi, JP;

Inventors:

Tadashi Hatanaka, Funabashi, JP;

Isao Adachi, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/13363 (2006.01); C08L 33/06 (2006.01); G02F 1/1335 (2006.01); C08F 220/30 (2006.01);
U.S. Cl.
CPC ...
G02F 1/13363 (2013.01); C08L 33/066 (2013.01); B32B 2457/202 (2013.01); C08F 2220/302 (2013.01); G02F 2001/133519 (2013.01); G02F 2001/133633 (2013.01); G02F 2202/025 (2013.01); Y10T 428/1005 (2015.01);
Abstract

A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, including: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; and a component (B) that is a cross-linking agent.


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