The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Oct. 26, 2015
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Shih-Yin Hsiao, Chiayi County, TW;

Kai-Kuen Chang, Keelung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4232 (2013.01); H01L 29/66545 (2013.01); H01L 29/66689 (2013.01); H01L 29/7816 (2013.01);
Abstract

The present invention provides a high-voltage metal-oxide-semiconductor transistor device and a manufacturing method thereof. First, a semiconductor substrate is provided and a dielectric layer and a conductive layer sequentially stacked on the semiconductor substrate. Then, the conductive layer is patterned to form a gate and a dummy gate disposed at a first side of the gate and followed by forming a first spacer between the gate and the dummy gate and a second spacer at a second side of the gate opposite to the first side, wherein the first spacer includes an indentation. Subsequently, the dummy gate is removed.


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