The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Dec. 04, 2013
Applicants:
Boe Technology Group Co., Ltd., Beijing, CN;
Chengdu Boe Optoelectronics Technology Co., Ltd., Chengdu, CN;
Inventors:
Assignees:
BOE Technology Group Co., Ltd., Beijing, CN;
Chengdu BOE Optoelectronics Technology Co., Ltd., Chengdu, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/283 (2006.01); H01L 21/285 (2006.01); H01L 31/18 (2006.01); G06F 3/041 (2006.01); H01L 21/033 (2006.01); H01L 21/28 (2006.01); H01L 27/12 (2006.01); H01L 29/43 (2006.01);
U.S. Cl.
CPC ...
H01L 21/2855 (2013.01); G06F 3/041 (2013.01); H01L 21/0331 (2013.01); H01L 21/28008 (2013.01); H01L 27/1259 (2013.01); H01L 29/43 (2013.01); H01L 31/1884 (2013.01); G06F 2203/04103 (2013.01); H01L 2924/0002 (2013.01); Y02E 10/50 (2013.01);
Abstract
A method for preparing film patterns; firstly, a complementary film pattern () to a desired film pattern () is prepared on a substrate () with an erasable agent; secondly, a whole layer of film () is formed on the complementary film pattern (); and thirdly, the desired film pattern () is obtained by removing the complementary film pattern (). The preparation method can simplify the production process and reduce the production cost of the film patterns.