The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Jan. 25, 2013
Asml Netherlands B.v., Veldhoven, NL;
Koninklijke Philips Electronics N.v., Eindhoven, NL;
Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Rosmalen, NL;
Antonius Franciscus Johannes De Groot, Someren, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Theodorus Petrus Maria Cadee, Asten, NL;
Robertus Mathijs Gerardus Rijs, Sevenum, NL;
Richard Henricus Adrianus Van Lieshout, Batenburg, NL;
ASML Netherland B.V., Veldhoven, NL;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.