The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2017

Filed:

Jun. 17, 2016
Applicant:

Sumitomo Electric Industries, Ltd., Osaka-shi, Osaka, JP;

Inventor:

Makoto Sasaki, Itami, JP;

Assignee:

Sumitomo Electric Industries, Ltd., Osaka-shi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 23/02 (2006.01); C30B 23/00 (2006.01); C30B 29/36 (2006.01); C30B 35/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C30B 23/025 (2013.01); C30B 23/00 (2013.01); C30B 23/02 (2013.01); C30B 29/36 (2013.01); C30B 35/007 (2013.01); H01L 21/02378 (2013.01); H01L 21/02529 (2013.01); H01L 21/02631 (2013.01); Y10T 428/21 (2015.01); Y10T 428/24355 (2015.01); Y10T 428/2982 (2015.01);
Abstract

An SiC crystal () has Fe concentration not higher than 0.1 ppm and Al concentration not higher than 100 ppm. A method of manufacturing an SiC crystal includes the following steps. SiC powders for polishing are prepared as a first source material (). A first SiC crystal () is grown by sublimating the first source material () through heating and precipitating an SiC crystal. A second source material () is formed by crushing the first SiC crystal (). A second SiC crystal () is grown by sublimating the second source material () through heating and precipitating an SiC crystal. Thus, an SiC crystal and a method of manufacturing an SiC crystal capable of achieving suppressed lowering in quality can be obtained.


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