The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Sep. 11, 2015
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Holger Walter, Abtsgmuend, DE;

Alexander Wolf, Oberkochen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 27/58 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70883 (2013.01); G02B 27/58 (2013.01); G03F 7/70091 (2013.01); G03F 7/70266 (2013.01); G03F 7/70308 (2013.01);
Abstract

A microlithographic apparatus includes an objective that includes a transmission filter that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter includes a plurality of gas outlet apertures that are configured to emit gas flows that pass through a space through which projection light propagates during operation of the microlithographic apparatus. The transmission filter further includes a control unit which is configured to vary a number density of ozone molecules in the gas flows individually for each gas flow. In this manner it is possible to finally adjust the transmittance distribution of the transmission filter.


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