The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9719859 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 01, 2017

Filed:

Dec. 10, 2014
Applicant:

Lasertec Corporation, Yokohama, Kanagawa, JP;

Inventors:

Haruhiko Kusunose, Kanagawa, JP;

Kiwamu Takehisa, Kanagawa, JP;

Assignee:

LASERTEC CORPORATION, Yokohama, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01J 9/02 (2006.01); G01N 21/45 (2006.01); G03F 1/26 (2012.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G01J 9/02 (2013.01); G01B 9/02041 (2013.01); G01B 9/02049 (2013.01); G01B 9/02098 (2013.01); G01N 21/45 (2013.01); G03F 1/26 (2013.01); G03F 1/84 (2013.01); G01B 2290/30 (2013.01); G01J 2009/0219 (2013.01);
Abstract

The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.


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