The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
Oct. 03, 2011
Applicant:
Juergen Weichart, Balzers, LI;
Inventor:
Juergen Weichart, Balzers, LI;
Assignee:
EVATEC AG, Trübbach, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23F 4/00 (2006.01); C23C 14/54 (2006.01); C23C 16/455 (2006.01); C23C 14/50 (2006.01); C23C 16/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23F 4/00 (2013.01); C23C 14/50 (2013.01); C23C 14/541 (2013.01); C23C 16/455 (2013.01); C23C 16/45517 (2013.01); C23C 16/463 (2013.01); H01J 37/32522 (2013.01); H01J 37/32871 (2013.01);
Abstract
An etching chamber is equipped with an actively-cooled element preferentially adsorbs volatile compounds that are evolved from a polymeric layer of a wafer during etching, which compounds will act as contaminants if re-deposited on the wafer, for example on exposed metal contact portions where they may interfere with subsequent deposition of metal contact layers. In desirable embodiments, a getter sublimation pump is also provided in the etching chamber as a source of getter material. Methods of etching in such a chamber are also disclosed.