The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

Dec. 31, 2015
Applicant:

L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

Inventors:

Satoko Gatineau, Seoul, KR;

Mikiko Kimura, Tsukuba, JP;

Christian Dussarrat, Tokyo, JP;

Jean-Marc Girard, Versailles, FR;

Nicolas Blasco, Grenoble, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/18 (2006.01); C23C 16/42 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C23C 16/42 (2013.01); H01L 21/02697 (2013.01); H01L 21/28556 (2013.01); H01L 21/28568 (2013.01); H01L 21/76841 (2013.01); H01L 21/28518 (2013.01); H01L 21/76843 (2013.01); H01L 21/76898 (2013.01);
Abstract

Methods of depositing Co-containing layers on substrates are disclosed. The vapor of a Co-containing film forming composition is introduced into a reactor having a substrate disposed therein. The Co-containing film forming compositions comprise a silylamide-containing precursor selected from Co[N(SiMe)](NMeEt), Co[N(SiMe)](NMeEt), or combinations thereof. At least part of the silylamide-containing precursor is deposited onto the substrate to form the Co-containing layer using a vapor deposition method.


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