The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2017
Filed:
Nov. 18, 2015
Nuflare Technology, Inc., Yokohama, JP;
Hideo Inoue, Miura-gun, JP;
NuFlare Technology, Inc., Yokohama, JP;
Abstract
A multi charged particle beam writing apparatus includes a deflector to collectively deflect each beam in an 'on' state, by tracking control in such a way as to follow stage movement, an obtaining processing circuitry to obtain a deviation amount of an irradiation position of each beam of multi-beams depending on a tracking amount of the tracking control, a correction coefficient calculation processing circuitry to calculate a correction coefficient for correcting the deviation amount of the irradiation position depending on the tracking amount, for each beam of the multi-beams and for each irradiation position, a shot data generation processing circuitry to generate shot data where deviation of an irradiation position of each beam of multi-beams depending on a tracking amount is to be corrected using a correction coefficient, for each tracking operation, and a deflection control processing circuitry to control plural blankers, based on the shot data.