The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2017
Filed:
Dec. 09, 2010
Hans Butler, Best, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Jeroen Pieter Starreveld, Eindhoven, NL;
Cornelius Adrianus Lambertus DE Hoon, Best, NL;
Francois Xavier Debiesme, Weert, NL;
Hans Butler, Best, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Jeroen Pieter Starreveld, Eindhoven, NL;
Cornelius Adrianus Lambertus De Hoon, Best, NL;
Francois Xavier Debiesme, Weert, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.