The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Dec. 16, 2014
Agilent Technologies, Inc., Santa Clara, CA (US);
Masaru Shimura, Tokyo, JP;
Kazuo Yamanaka, Tokyo, JP;
Agilent Technologies Inc., Santa Clara, CA (US);
Abstract
A process for automatically creating a measurement method suitable for plasma ion source mass spectrometry, including: semi-quantitatively measuring all elements in the sample that affect the measurement; determining a plasma condition based on the total concentration of the semi-quantitatively measured elements; for each of the semi-quantitatively measured elements, estimating signal strengths of the element and an interference component in the sample to be measured and based on the resultant estimates, estimating the concentration of the element; and, based on the estimated signal strengths of the elements and the interference components and the estimated concentrations of the elements, creating at least one mass spectrometry method including at least one of: (1) a plasma condition; (2) an internal standard to be added to the sample; (3) a tuning condition for the collision/reaction cell; (4) a mass-to-charge ratio used in the mass spectrometer; and (5) an integration time used in the mass spectrometer.