The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
May. 31, 2016
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Johannes Bol, Oberkochen, DE;
Hans-Juergen Rostalski, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography, with an EUV light source (), a detector () configured to detect EUV radiation reflected at the reflective optical element (), and an imaging system (), which images object points on the reflective optical element onto respective image points on the detector, wherein the imaging system is configured to reflect the EUV radiation, a first optical component (), and at least one second optical component (). Both at the first optical component and at the second optical component, reflection angles with respect to respective surface normals that respectively occur during reflection of the EUV radiation are at least 70°.