The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Jul. 24, 2012
Hyug-gyo Rhee, Daejeon, KR;
Yun Woo Lee, Daejeon, KR;
Hyug-Gyo Rhee, Daejeon, KR;
Yun Woo Lee, Daejeon, KR;
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE, Daejeon, KR;
Abstract
The fine pattern manufacturing apparatus, which can improve height direction resolution in a laser irradiation method. More specifically, the invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the manufacturing apparatus, in which a height direction interference generation unit is included to interfere laser beams respectively having a different plane direction width, and height direction line width can be improved by irradiating an interference laser beam having an interference fringe direction of height direction on a photosensitive film.