The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2017

Filed:

Jun. 11, 2014
Applicant:

K.c. Tech Co., Ltd., Anseong-si, Gyeonggi-do, KR;

Inventors:

Moon Gi Cho, Seoul, KR;

Jun Ho Son, Gyeongsan-shi, KR;

Assignee:

K.C. TECH CO., LTD., Anseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); A46B 13/00 (2006.01); B08B 1/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67046 (2013.01); A46B 13/001 (2013.01); B08B 1/04 (2013.01);
Abstract

Provided are a substrate cleaning apparatus and method and a brush assembly used therein. The substrate cleaning apparatus for contact-cleaning a substrate includes a cleaning brush rotatably disposed in a cylindrical shape and having an outer circumferential surface contacting the substrate to clean the substrate. Here, the cleaning brush includes a plurality of pressure chambers expanding by a fluid pressure and disposed along a longitudinal direction of a rotation axis rotating at a central portion of the cleaning brush, and the plurality of pressure chambers are individually expandable to allow a portion of the outer circumferential surface to protrude in a radial direction and thus contact-clean a portion of the substrate.


Find Patent Forward Citations

Cho, Moon. (2017). Substrate cleaning apparatus and method and brush assembly used therein (U.S. Patent No. 9704729). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9704729

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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