The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2017
Filed:
Sep. 14, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Jens Timo Neumann, Aalen, DE;
Frank Schlesener, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A method for measuring an optical symmetry property on a microlithographic projection exposure apparatus () together with a microlithographic projection exposure apparatus and an associated microlithographic measurement mask are disclosed. The method includes arranging at least one measurement structure () in an exposure beam path () of the projection exposure apparatus, wherein the measurement structure includes a pinhole stop () and a diffraction grating () arranged within an aperture () of the pinhole stop. Furthermore, the method includes measuring an intensity of a diffracted radiation generated at the diffraction grating () after interaction of the radiation with at least one optical element () of the projection exposure apparatus.