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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9703195 B1

PDFFull Text
Date of Patent:
Jul. 11, 2017

Filed:

Jul. 22, 2015

Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hayato Namai, Tokyo, JP;

Kota Nishino, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); C08F 12/32 (2006.01); C08F 12/22 (2006.01); C08F 220/18 (2006.01); C08F 212/14 (2006.01); C07D 307/93 (2006.01); C07D 307/33 (2006.01); C07D 327/04 (2006.01); C07D 493/18 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07D 307/33 (2013.01); C07D 307/93 (2013.01); C07D 327/04 (2013.01); C07D 493/18 (2013.01); C08F 12/22 (2013.01); C08F 12/32 (2013.01); C08F 212/14 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01);
Abstract

A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), Rrepresents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that Rin the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that Rin the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.

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