The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
May. 19, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Shigenobu Maeda, Seongnam-si, KR;
Bo-Ram Kim, Yongin-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 27/092 (2006.01); H01L 27/108 (2006.01); H01L 27/11 (2006.01); H01L 29/06 (2006.01); H01L 29/267 (2006.01);
U.S. Cl.
CPC ...
H01L 29/785 (2013.01); H01L 27/0924 (2013.01); H01L 27/108 (2013.01); H01L 27/11 (2013.01); H01L 29/0649 (2013.01); H01L 29/1054 (2013.01); H01L 29/267 (2013.01); H01L 29/66795 (2013.01); H01L 29/66818 (2013.01);
Abstract
Methods of forming a semiconductor device are provided. A method of forming a semiconductor device includes forming a semiconductor layer on a fin, where the fin and the semiconductor layer include first and second semiconductor materials, respectively. Moreover, the method includes defining first and second active fins that include the second semiconductor material, by removing at least a portion of the fin. Related semiconductor devices are also provided.
Maeda, Shigenobu. (2017). Methods of forming semiconductor devices, including forming a semiconductor material on a fin, and related semiconductor devices (U.S. Patent No. 9698268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9698268
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile