The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Feb. 12, 2016
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Elliot John Smith, Dresden, DE;

Sven Beyer, Dresden, DE;

Jan Hoentschel, Dresden, DE;

Alexander Ebermann, Dresden, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/13 (2006.01); H01L 49/02 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 27/12 (2006.01); H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
H01L 27/13 (2013.01); H01L 21/84 (2013.01); H01L 27/1207 (2013.01); H01L 28/60 (2013.01); H01L 29/0649 (2013.01); H01L 29/66477 (2013.01); H01L 29/78 (2013.01);
Abstract

The present disclosure provides, in accordance with some illustrative embodiments, a capacitor structure comprising an active region formed in a semiconductor substrate, a MOSFET device comprising source and drain regions formed in the active region and a gate electrode formed above the active region, and a first electrode and a second electrode formed in a metallization layer above the MOSFET device, wherein the first electrode is electrically connected with the source and drain regions via respective source and drain contacts and the second electrode is electrically connected with the gate electrode via a gate contact.


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