The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2017

Filed:

Jul. 14, 2014
Applicant:

Taiwan Semiconductor Manufacturing Co. Ltd., Hsin-Chu, TW;

Inventors:

Long-Shih Lin, Zhubei, TW;

Fu-Hsiung Yang, Zhongli, TW;

Kun-Ming Huang, Taipei, TW;

Ming-Yi Lin, Hsin-Chu, TW;

Paul Chu, New Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/739 (2006.01); G01R 31/12 (2006.01); H01L 29/08 (2006.01); G01R 31/26 (2014.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 21/308 (2013.01); H01L 21/3083 (2013.01); H01L 29/66325 (2013.01); H01L 29/66689 (2013.01); H01L 29/7394 (2013.01); H01L 29/7824 (2013.01); G01R 31/129 (2013.01); G01R 31/2637 (2013.01); H01L 21/76275 (2013.01); H01L 21/76283 (2013.01); H01L 29/086 (2013.01);
Abstract

Some embodiments of the present disclosure relate to a method to increase breakdown voltage of a power device. A power device is formed on a silicon-on-insulator (SOI) wafer made up of a device wafer, a handle wafer, and an intermediate oxide layer. A recess is formed in a lower surface of the handle wafer to define a recessed region of the handle wafer. The recessed region of the handle wafer has a first handle wafer thickness, which is greater than zero. An un-recessed region of the handle wafer has a second handle wafer thickness, which is greater than the first handle wafer thickness. The first handle wafer thickness of the recessed region provides a breakdown voltage improvement for the power device.


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