The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Jul. 16, 2014
Advanced Micro-fabrication Equipment Inc, Shanghai, Shanghai, CN;
Lu Chen, Shanghai, CN;
Chaoqian Zhang, Shanghai, CN;
Yanzhong Ma, Shanghai, CN;
Yousen Li, Shanghai, CN;
Zhehao Chen, Shanghai, CN;
Steven Tianxiao Lee, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI, Shanghai, CN;
Abstract
A method for measuring a temperature of a film in a reaction chamber is provided. The method includes: obtaining reflectivity sampling data R of a sampling point set in a detection area of the film for light with a wavelength λ, and thermal radiation value sampling data E of the sampling point set; obtaining a first correction factor α and a second correction factor γ according to values of at least two sampling data groups, wherein 0<α≦1, 0≦γ≦1; obtaining a blackbody radiation value Lof the detection area of the film for the light with the wavelength λ according to the first correction factor α, the second correction factor γ and the values of the at least two sampling data groups; obtaining a temperature T of the detection area by looking up a table according to the blackbody radiation value Land the wavelength λ.