The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

Feb. 19, 2013
Applicants:

Kyushu University, National University Corporation, Fukuoka-shi, JP;

Lintec Corporation, Itabashi-ku, JP;

Inventors:

Kunihisa Kato, Itabashi-ku, JP;

Chihaya Adachi, Fukuoka, JP;

Koji Miyazaki, Chiyoda-ku, JP;

Teruaki Hayakawa, Chiyoda-ku, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 35/16 (2006.01); H01L 35/22 (2006.01); H01L 35/30 (2006.01); H01L 35/32 (2006.01); H01L 35/34 (2006.01);
U.S. Cl.
CPC ...
H01L 35/30 (2013.01); H01L 35/16 (2013.01); H01L 35/32 (2013.01); H01L 35/34 (2013.01);
Abstract

The present invention provides a thermoelectric conversion material having a low thermal conductivity and having an improved figure of merit, and a method for producing it. The thermoelectric conversion material has, as formed on a substrate having a nano-level microporous nanostructure, a thermoelectric semiconductor layer prepared by forming a thermoelectric semiconductor material into a film, wherein the substrate is a block copolymer substrate formed of a block copolymer that comprises a polymethyl methacrylate unit and a polyhedral oligomeric silsesquioxane-containing polymethacrylate unit, and the thermoelectric semiconductor material is a p-type bismuth telluride or an n-type bismuth telluride. The production method comprises a substrate formation step of forming the nanostructure-having block copolymer substrate, and a film formation step of forming a p-type bismuth telluride or an n-type bismuth telluride into a film to thereby provide a thermoelectric semiconductor layer.


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