The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

Oct. 03, 2016
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventors:

Norikazu Nakamura, Sagamihara, JP;

Atsushi Yamada, Isehara, JP;

Junji Kotani, Atsugi, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0256 (2006.01); H01L 35/24 (2006.01); H01L 51/00 (2006.01); H01L 21/338 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 29/66 (2006.01); H02M 3/335 (2006.01); H03F 3/19 (2006.01); H03F 1/32 (2006.01); H03F 3/21 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/66462 (2013.01); H02M 3/33507 (2013.01); H03F 1/3241 (2013.01); H03F 3/19 (2013.01); H03F 3/21 (2013.01); H03F 2200/333 (2013.01);
Abstract

A compound semiconductor device includes a compound semiconductor stacked structure, the compound semiconductor stacked structure including: an electron transit layer; an electron supply layer formed above the electron transit layer, the electron supply layer containing an n-type impurity; and a cap layer formed above the electron supply layer and containing the n-type impurity, in which in the electron supply layer, a concentration of the n-type impurity contained therein is non-uniform in a film thickness direction and a concentration of the n-type impurity in a surface of the cap layer side is lower than a maximum concentration of the n-type impurity in the electron supply layer.


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