The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

Aug. 30, 2016
Applicant:

Stmicroelectronics (Rousset) Sas, Rousset, FR;

Inventors:

Arnaud Regnier, Les Taillades, FR;

Jean-Michel Mirabel, Cabries, FR;

Stephan Niel, Meylan, FR;

Francesco La Rosa, Rousset, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 27/11524 (2017.01); H01L 29/788 (2006.01); H01L 29/78 (2006.01); G11C 16/04 (2006.01); H01L 29/66 (2006.01); H01L 27/11521 (2017.01);
U.S. Cl.
CPC ...
H01L 29/42336 (2013.01); G11C 16/0433 (2013.01); H01L 27/11521 (2013.01); H01L 27/11524 (2013.01); H01L 29/42324 (2013.01); H01L 29/42328 (2013.01); H01L 29/66825 (2013.01); H01L 29/7831 (2013.01); H01L 29/7881 (2013.01); H01L 29/7885 (2013.01); H01L 29/7889 (2013.01);
Abstract

A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.


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