The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

Jun. 28, 2013
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Barak Freedman, Binyamina, IL;

Sagi Ben Moshe, Kiryat Byalik, IL;

Ron Kimmel, Haifa, IL;

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/18 (2006.01); G02B 26/08 (2006.01); G01B 11/25 (2006.01); G02B 26/10 (2006.01); G06K 9/00 (2006.01); H04N 13/02 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0833 (2013.01); G01B 11/254 (2013.01); G02B 26/105 (2013.01); G06K 9/00604 (2013.01); H04N 13/0203 (2013.01);
Abstract

Techniques and configurations for an apparatus for projecting a light pattern on an object are described. In one embodiment, the apparatus may include a laser arrangement configured to generate a laser line, a tiltable micro-electromechanical system (MEMS) mirror configured to tiltably reflect the laser line, and a controller configured to control tilting of the MEMS mirror to enable the reflected laser line to project a light pattern on the object. The controller may be configured to control the MEMS mirror with a tilting frequency that is complementary to an optical power of the laser line, or to control the optical power of the laser line to be complementary to the tilting frequency of the MEMS mirror.


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