The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

Jun. 20, 2008
Applicants:

Gary T. Boyd, Woodbury, MN (US);

Ji-young Choi, Gyeonggi-Do, KR;

John T. Cowher, Austin, TX (US);

Yasuyuki Daigo, Machida, JP;

Kenneth A. Epstein, St. Paul, MN (US);

Shandon D. Hart, Corning, NY (US);

Charles D. Hoyle, Stillwater, MN (US);

Min-young Ji, Suwon, JP;

Chideuk Kim, Gyunggi-Do, KR;

Byung-soo Ko, Seoul, KR;

Keith M. Kotchick, St. Paul, MN (US);

Wade D. Kretman, Afton, MN (US);

David J. Lamb, Oakdale, MN (US);

Seo-hern Lee, Kyonggi-Do, KR;

Eric W. Nelson, Stillwater, MN (US);

Youngsoo Park, Kyonggi-Do, KR;

Xianneng Peng, Shanghai, CN;

Yuji Saito, Sagamihara, JP;

Naoya Taniguchi, Sagamihara, JP;

John F. Van Derlofske, Iii, Minneapolis, MN (US);

Leland R. Whitney, St. Paul, MN (US);

Xingpeng Yang, Shanghai, CN;

Yang Yu, Suzhou, CN;

Jie Zhou, Shanghai, CN;

Rui Zhang, Shanghai, CN;

Inventors:

Gary T. Boyd, Woodbury, MN (US);

Ji-Young Choi, Gyeonggi-Do, KR;

John T. Cowher, Austin, TX (US);

Yasuyuki Daigo, Machida, JP;

Kenneth A. Epstein, St. Paul, MN (US);

Shandon D. Hart, Corning, NY (US);

Charles D. Hoyle, Stillwater, MN (US);

Min-Young Ji, Suwon, JP;

Chideuk Kim, Gyunggi-Do, KR;

Byung-Soo Ko, Seoul, KR;

Keith M. Kotchick, St. Paul, MN (US);

Wade D. Kretman, Afton, MN (US);

David J. Lamb, Oakdale, MN (US);

Seo-Hern Lee, Kyonggi-Do, KR;

Eric W. Nelson, Stillwater, MN (US);

Youngsoo Park, Kyonggi-Do, KR;

Xianneng Peng, Shanghai, CN;

Yuji Saito, Sagamihara, JP;

Naoya Taniguchi, Sagamihara, JP;

John F. Van Derlofske, III, Minneapolis, MN (US);

Leland R. Whitney, St. Paul, MN (US);

Xingpeng Yang, Shanghai, CN;

Yang Yu, Suzhou, CN;

Jie Zhou, Shanghai, CN;

Rui Zhang, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 7/04 (2006.01); F21V 8/00 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0053 (2013.01); G02B 6/0055 (2013.01); G02F 2001/133607 (2013.01); Y10T 29/49002 (2015.01);
Abstract

A backlight includes a light source and one or more light recycling films. The light source generates light that exits the light source with an angular exit distribution. The light recycling films are oriented in relation to the light source so that the prism peaks of the recycling films are oriented away from the light source. The recycling films have a range of optimal incident angles that allow light to pass through the recycling films without recycling. The components of the light source, the characteristics of the recycling films, or both, are configured to control the overlap between the exit distribution of the light source and the optimal incident angle range of the recycling films.


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