The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Sep. 30, 2011
Applicants:
Ming-cheng Lin, Yilan, TW;
Che-hung Liu, Kaohsiung, TW;
Inventors:
Ming-Cheng Lin, Yilan, TW;
Che-Hung Liu, Kaohsiung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/72 (2006.01); G01R 33/12 (2006.01); G01R 33/07 (2006.01); G01R 31/26 (2014.01); G01R 15/20 (2006.01);
U.S. Cl.
CPC ...
G01R 33/072 (2013.01); G01R 31/2648 (2013.01); G01R 15/202 (2013.01);
Abstract
A Hall-Effect measure apparatus comprises a magnetic source, a wafer on a thermal chuck, a dc current source and a voltage meter. The magnetic source generates a magnetic field in a perpendicular position relative to the wafer. Furthermore, the magnetic field is targeted at a specific region of the wafer to be tested. By performing a Hall-Effect measurement and van der Pauw measurement, the carrier mobility of the specific region of the wafer can be calculated.