The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

May. 27, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Kouzou Tachibana, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 7/16 (2006.01); F26B 21/02 (2006.01);
U.S. Cl.
CPC ...
B05C 11/023 (2013.01); G03F 7/162 (2013.01); H01L 21/6715 (2013.01); H01L 21/68721 (2013.01); H01L 21/68742 (2013.01); F26B 21/028 (2013.01);
Abstract

A coating film forming apparatus includes a substrate holding unit, a ring-shaped member annularly installed along a circumferential direction of the substrate so as to cover an upper side of a peripheral edge portion of the substrate, and a control unit that outputs a control signal so as to perform: positioning the ring-shaped member at a processing position where an air flow flowing above the peripheral edge portion of the substrate is straightened; rotating the substrate at a first revolution number such that a coating liquid supplied to a central portion of the substrate is diffused toward the peripheral edge portion by a centrifugal force; bringing the ring-shaped member to a retreated position where an air flow flowing near a front surface of the substrate is prevented from becoming turbulent; and reducing the revolution number of the substrate to a second revolution number lower than the first revolution number.


Find Patent Forward Citations

Loading…