The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2017

Filed:

Jul. 07, 2015
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Meng-Tsung Ko, Hsinchu, TW;

Yung-Tai Hung, Hsinchu, TW;

Chin-Ta Su, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/522 (2006.01); H01L 23/532 (2006.01); H01L 21/768 (2006.01); H01L 23/535 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76883 (2013.01); H01L 21/76843 (2013.01); H01L 23/5226 (2013.01); H01L 23/535 (2013.01); H01L 23/53266 (2013.01);
Abstract

A method of forming a conductive plug is disclosed. A material layer having at least one opening is provided on a substrate. A first conductive layer is deposited in the opening, wherein the first conductive layer does not completely fill up the opening. A second conductive layer is deposited on the first conductive layer. A surface treatment is performed after the step of depositing the first conductive layer and before the step of depositing the second conductive layer, so that the first deposition rate of the second conductive layer at the lower portion of the opening is greater the second deposition rate of the second conductive layer at the upper portion of the opening. A void-free conductive plug can be easily formed with the method of the invention.


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