The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Nov. 11, 2011
Sumihisa Masuda, Minato-ku, JP;
Kazuhiro Narahara, Minato-ku, JP;
Sumihisa Masuda, Minato-ku, JP;
Kazuhiro Narahara, Minato-ku, JP;
SUMCO Corporation, Minato-ku, JP;
Abstract
The present invention provides a method of producing an epitaxial wafer having a highly flat rear surface without polishing top and rear surfaces of the epitaxial wafer after forming an epitaxial film. A method of producing an epitaxial waferaccording to the present invention comprises a step of preparing a semiconductor waferhaving a beveled portionformed on its end portion, a first surface, a second surfaceopposite to the first surface, and edgesandon both of the first surfaceand the second surface, the each edgeandis boundary with the beveled portion; a step of processing of rolling off an outer peripheral portionof the first surfaceto form a roll-off region, the outer peripheral portionis extending outward of the wafer from a predetermined position P inner than the position of the edgeonthe first surface; and a step of forming a first epitaxial filmon the second surface