The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Jun. 15, 2015
Applicant:
Advantest Corporation, Tokyo, JP;
Inventors:
Akio Yamada, Saitama, JP;
Shinji Sugatani, Saitama, JP;
Assignee:
ADVANTEST CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70425 (2013.01); G03F 9/7088 (2013.01); H01J 37/3174 (2013.01);
Abstract
An exposure apparatus is configured to include an electronic optical systemthat generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detectorand a fog preventing mechanismthat are placed between the electronic optical systemand the wafer stage WS. A substrateconstitutes the fog preventing mechanism, and opening holesthat penetrate up to the upper surface of the substrateare formed in a first area of the bottom surface of the substrate, and opening holesthat are closed in the substrateare formed in a second area of the bottom surface.