The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Nov. 06, 2012
Applicant:
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Inventor:
Masumi Shirai, Tokyo, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); G01B 15/00 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G01B 15/00 (2013.01); H01J 37/147 (2013.01); H01J 37/20 (2013.01); H01J 37/22 (2013.01); H01J 37/222 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2809 (2013.01); H01J 2237/2817 (2013.01);
Abstract
A scanning electron microscope (SEM) is configured so that SEM images are acquired while scanning a pyramid pattern on a sample plane from four directions. Landing angle of the electron beam is calculated from these SEM images, which are then averaged, whereby inclination angle of the electron beam that is less influenced from scan distortion can be found.